Thermodynamic investigation of the MOCVD of copper films from bis(2,2,6,6-tetramethyl-3,5-heptadionato)copper(II)

Bulletin of Materials Science

Volumn 25, Issue 5, 2002, Pages 391-398

  Mukhopadhyay, Sukanya ^a   Shalini, K ^a   Devi, Anjana ^a,b   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Copper; MOCVD; Precursor; Thermodynamics; Thin films

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COPPER COMPOUNDS; FILM GROWTH; FREE ENERGY; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANOMETALLICS; THERMODYNAMICS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

PRECURSOR MATERIALS;

METALLIC FILMS;

EID: 0036772529     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02708016     Document Type: Article

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