MOCVD of cobalt oxide thin films: Dependence of growth, microstructure, and optical properties on the source of oxidation

Journal of Crystal Growth

Volumn 254, Issue 3-4, 2003, Pages 368-377

  Mane, Anil U ^a   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

A3. Chemical vapor deposition processes; Al. Microstructure; Al. Optical bandgap; B1. Cobalt oxide; B1. Nitrous oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; COBALT COMPOUNDS; CRYSTALLIZATION; GROWTH KINETICS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; MORPHOLOGY; OPTICAL PROPERTIES; OXIDATION; PHASE COMPOSITION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROPHOTOMETERS; X RAY DIFFRACTION ANALYSIS;

OPTICAL BANDGAP;

THIN FILMS;

EID: 0037809420     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)01156-4     Document Type: Article

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