A surface roughness predictive model in deterministic polishing of ground glass moulds

International Journal of Machine Tools and Manufacture

Volumn 49, Issue 1, 2009, Pages 1-7

  Savio, Gianpaolo ^a   Meneghello, Roberto ^a   Concheri, Gianmaria ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

Abbott Firestone; Glass; Material ratio; Polishing; Roughness; Surface texture

Indexed keywords

FRICTION; GLASS; GRINDING (MACHINING); METAL ANALYSIS; MOLDS; POLISHING; PROBABILITY DENSITY FUNCTION; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY;

ABBOTT-FIRESTONE; ATOMIC FORCE MICROSCOPES; DETERMINISTIC POLISHING; DEVELOPED MODELS; FRICTION FORCES; GLASS COMPONENTS; GROUND GLASSES; HERTZ THEORIES; MODEL ASSESSMENTS; MODEL-BASED; NC GRINDING; OPERATING PARAMETERS; POLISHING PROCESSES; PRECISION OPTICS; PREDICTIVE MODELS; PRESTON COEFFICIENTS; PROCESS PARAMETERS; ROUGHNESS; ROUGHNESS EVOLUTIONS; ROUGHNESS PARAMETERS; SURFACE TEXTURE; TIME INTERVALS;

SURFACES;

EID: 55549104693     PISSN: 08906955     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijmachtools.2008.09.001     Document Type: Article

References (28)

1. Evans C.J., Paul E., Dornfeld D., Lucca D.A., Byrne G., Tricard M., Klocke F., Dambon O., and Mullany B.A. Material removal mechanisms in lapping and polishing. CIRP Annals-Manufacturing 52 2 (2003) 611-633
2. J. Luo, D.A. Dornfeld, Review of chemical-mechanical planarization modeling for integrated circuit fabrication: from particle scale to die and wafer scales, LMA Reports University of California at Berkeley, 2003, pp. 107-135.
3. Lai J.Y. Mechanics, Mechanism, and Modeling of the Chemical Mechanical Polishing Process (2001), Massachusetts Institute of Technology
4. Preston F.W. The theory and design of plate glass polishing machines. Journal of the Society of Glass Technology 11 (1927) 214-256
5. Brown N.J., Baker P.C., and Maney R.T. Optical polishing of metals. Proceeding of SPIE 306 (1981) 42-57
6. Cook L.M. Chemical processes in glass polishing. Journal of Non-Crystalline Solids 120 (1990) 152-171
7. T.-K. Yu, C.C. Yu, M. Orlowski, A Statistical polishing pad model for chemical-mechanical polishing, in: Proceedings of the IEEE, 1993, pp. 865-868.
8. Runnels S.R. Feature-scale fluid-based erosion modeling for chemical-mechanical polishing. Journal of the Electrochemical Society 141 7 (1994) 1900-1904
9. Runnels S.R., and Eyman L.M. Tribology analysis of chemical-mechanical polishing. Journal of the Electrochemical Society 141 6 (1994) 1698-1701
10. Venkatesh V.C., Izman S., and Mahadevan S.C. Electro-chemical mechanical polishing of copper and chemical mechanical polishing of glass. Journal of Materials Processing Technology 149 (2004) 493-498
11. Venkatesh V.C., Inasaki I., Toenshof H.K., Nakagawa T., and Marinescu I.D. Observation on polishing and ultraprecision machining of semiconductor substrate materials. Annals of the CIRP 44 2 (1995) 611-618
12. Wang C.-C., Lin S.-C., and Hochen H. A material removal model for polishing glass-ceramic and aluminum magnesium storage disks. International Journal of Machine Tools & Manufacture 42 (2002) 979-984
13. Luo J., and Dornfeld D.A. Material removal mechanism in chemical mechanical polishing: theory and modeling. IEEE Transactions on Semiconductor Manufacturing 14 2 (2001) 112-133
14. Seok J., Sukama C.P., Kim A.T., Tichy J.A., and Cale T.S. Multiscale material removal modeling of chemical mechanical polishing. Wear 254 (2003) 307-320
15. Wang L., Zhang K., Song Z., and Feng S. Ceria concentration effect on chemical mechanical polishing of optical glass. Applied Surface Science 253 (2007) 4951-4954
16. Park B., Lee H., Park K., Kim H., and Jeong H. Pad roughness variation and its effect on material removal profile in ceria-based CMP slurry. Journal of Materials Processing Technology 203 (2008) 287-292
17. Park K., Park J., Park B., and Jeong H. Correlation between break-in characteristics and pad surface in silicon wafer polishing. Journal of Materials Processing Technology 205 (2008) 360-365
18. Wang Y.-G., Zhao Y.-W., Jianga J.-Z., Li X., and Bai J. Modeling effect of chemical-mechanical synergy on material removal at molecular scale in chemical-mechanical polishing. Wear 265 5-6 (2008) 721-728
19. Jiang J.-Z., Zhao Y.-W., Wang Y.-G., and Luo J.-B. A chemical mechanical polishing model based on the viscous flow of the amorphous layer. Wear 265 7-8 (2008) 992-998
20. Meneghello R., Concheri G., Savio G., and Comelli D. Surface and geometry error modeling in brittle mode grinding of ophthalmic lenses moulds. International Journal of Machine Tools & Manufacture 46 (2006) 1662-1670
21. R. Meneghello, G. Concheri, G. Savio, Curvature error estimation in ground and polished surface of glass mould, in: Proceedings of the XV ADM-XVII Ingegraf, 2005.
22. ISO 4287: 1997, Geometrical Product Specifications (GPS)-Surface Texture: Profile Method-Terms, Definitions and Surface Texture Parameters, 1997.
23. Bhushan B. Modern Tribology Handbook (2001), CRC Press, Boca Raton
24. Whitehouse D.J. Handbook of Surface and Nanometrology (2003), Institute of Physics Publishing, Bristol
25. ISO/CD 25178-2: 2005, Geometrical product specifications (GPS)-surface texture: areal-Part 2: terms, definitions and surface texture parameter, 2005.
26. Hertz H. Gesammelte werke. Leipzig 1 (1895) 155-196
27. Reye T. Zur Theorie der Zapfenreibung. Der Civilingenineur 4 (1860) 235-255
28. Carpinteri A., and Pugno N. Evolutionary fractal theory of erosion and experimental assessment on MIR space station. Wear 257 3-4 (2004) 408-413