Ceria concentration effect on chemical mechanical polishing of optical glass

Applied Surface Science

Volumn 253, Issue 11, 2007, Pages 4951-4954

  Wang, Liangyong ^a   Zhang, Kailiang ^a   Song, Zhitang ^a   Feng, Songlin ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Ceria; CMP; Concentration; Physical model; Quantum origin

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC FORCE MICROSCOPY; CHEMICAL MECHANICAL POLISHING; CONCENTRATION (PROCESS); OPTICAL GLASS; SCANNING ELECTRON MICROSCOPY;

CERIA SLURRIES; PHYSICAL MODEL; QUANTUM ORIGIN;

CERIUM COMPOUNDS;

EID: 33847350559     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.10.074     Document Type: Article

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