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Japanese Journal of Applied Physics

Volumn 47, Issue 9 PART 1, 2008, Pages 7314-7316

Sensitivity of electroplating conditions on Young's modulus of thin film

(2) Kim, Sang Hyun a Kang, Sang Wook a

a Hansung University (South Korea)

Author keywords

Atomic force microscope; Current density; Electroplated nickel; Microcantilever; Resonant frequency; Young's modulus

Indexed keywords

ATOMIC PHYSICS; ATOMS; CURRENT DENSITY; ELASTICITY; ELECTROCHEMISTRY; ELECTROPLATING; NATURAL FREQUENCIES; NICKEL ALLOYS; NICKEL PLATING; PLATING; THICK FILMS; THIN FILM DEVICES; THIN FILMS; ATOMIC FORCE MICROSCOPY; COMPOSITE MICROMECHANICS; MICROSCOPES; NICKEL;

ATOMIC FORCE MICROSCOPE; ELECTROPLATED NICKEL; MICROCANTILEVER; RESONANT FREQUENCY; YOUNG'S MODULUS;

ELASTIC MODULI;

EID: 55149125808 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.7314 Document Type: Article

Times cited : (6)

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