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Volumn 517, Issue 1, 2008, Pages 453-455
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Ellipsometric analysis of mixed metal oxides thin films
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Author keywords
Chemical oxide; Density; Hafnium silicate; High dielectric constant; Spectroscopic ellipsometry
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Indexed keywords
CERAMIC CAPACITORS;
DIELECTRIC WAVEGUIDES;
ELLIPSOMETRY;
HAFNIUM;
HAFNIUM COMPOUNDS;
OXIDE FILMS;
OXIDES;
PERMITTIVITY;
PROBABILITY DENSITY FUNCTION;
SILICATES;
SMELTING;
SPECTROSCOPIC ELLIPSOMETRY;
STOICHIOMETRY;
THICK FILMS;
THIN FILMS;
CHEMICAL NATURES;
CHEMICAL OXIDE;
DENSITY;
DEPOSITION METHODS;
DIELECTRIC CONSTANTS;
DIELECTRIC FUNCTIONS;
ELLIPSOMETRIC ANALYSES;
FILM DENSITIES;
HAFNIUM OXIDE FILMS;
HAFNIUM OXIDES;
HAFNIUM SILICATE;
HAFNIUM SILICATE FILMS;
HAFNIUM SILICATES;
HIGH DIELECTRIC CONSTANT;
MIXED METAL OXIDES;
OPTICAL;
SPECTROSCOPIC ELLIPSOMETRY MEASUREMENTS;
DIELECTRIC MATERIALS;
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EID: 54849441614
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.08.119 Document Type: Article |
Times cited : (24)
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References (12)
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