Magnetron sputtering of aluminium nitride thin films for thermal management

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Duquenne, Cyril ^a   Popescu, Bogdhan ^a   Tessier, Pierre Yves ^a   Besland, Marie Paule ^a   Scudeller, Yves ^a   Brylinski, Christian ^b   Delage, Sylvain ^b   Djouadi, M Abdou ^a  

^a UNIVERSITÉ DE NANTES   (France)

^b ALCATEL THALES III V LAB   (France)

Author keywords

Aluminium nitride; Magnetron sputtering; Thermal properties; Thin films

Indexed keywords

ALUMINUM NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; III-V SEMICONDUCTORS; MAGNETRON SPUTTERING; NITRIDES; SCANNING ELECTRON MICROSCOPY; SPECTROMETRY; THERMAL CONDUCTIVITY OF SOLIDS; THERMODYNAMIC PROPERTIES; X RAY DIFFRACTION;

DC MAGNETRON SPUTTERING; DEPOSITION PARAMETERS; FOURIER TRANSFORM INFRARED SPECTROMETRY; HEXAGONAL CRYSTALLINE; NITRIDE THIN FILMS; PHYSICOCHEMICAL PROPERTY; RAMAN SPECTROMETRIES; SILICON SUBSTRATES;

THIN FILMS;

EID: 54749131907     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730101     Document Type: Conference Paper

References (23)

1. T. P. Drusedau, J. Blasing, Thin Solid Films 2000, 27, 377.
2. C.-L. Huang, K.-W. Tay, L. Wu, Solid-State Electron. 2005, 49, 219.
3. K. Watari, S. L. Shinde, MRS bull. 2001, June, 440.
4. N. Lieske, R. Hezel, J. Appl. Phys. 1981, 52, 5806.
5. M. Ishihara, S. I. Li, Thin Solid Films 1998, 316, 152.
6. F. R. Brotzen, P. J. Loos, D. P. Brady, Thin Solid Films 1992, 207, 197.
7. W. J. Meng, J. A. Sell, G. L. Eesley, T. A. Perry, J. Appl. Phys. 1993, 14, 2411.
8. M. Ishihara, K. Yamamoto, F. Kokai, Y. Koga, Jpn. J. Appl. Phys., 2001, 40, 2413.
9. W. J. Meng, J. A. Sell, G. L. Eesley, T. A. Perry, J. Appl. Phys. 1993, 14, 2411.
10. M. B. Assouar, O. Elmazria, V. Mortet, P. Alnot, M. A. Djouadi, 10th International Meeting on Ferroelectricity 2001, 273, 229.
11. V. Mortet, A. Vasina, P.-Y. Jouan, O. Elmazria, M-A. Djouadi, Surf. Coat. Tech. 2003, 176, 88.
12. O. J. Gregory, A. B. Slot, P. S. Amons, E. E. Crisman, Surf. Coat. Technol. 1995, 88, 79.
13. G. F. Iriarte, F. Engelmann, I. V. Kater djiev, J. Mater. Res. 2002, 17, 1469.
14. G. F. Iriarte, F. Engelmark, M. Ottosson, I. V. Katardjiev, J. Mater. Res. 2003, 18, 423.
15. F. Engelmark, G. Fuentes, I. V. Katardjiev, A. Harsta, U. Smith, S. Berg, J. Vac. Sci. Technol. A 2000, 18, 1609.
16. F. Engelmark, G. F. Iriarte, I. V. Katardjiev, M. Ottoson, P. Muralt, S. Berg, J. Vac. Sci. Tech. A 2001, 19, 2664.
17. Tilo P. Drüsedau, Jürgen Bläsing, Thin Solid Films 2000, 377, 27.
18. A. Jacquot, B. Lenoir, A. Dauscher, P. Verardi, F. Craciun, M. Stölzer, M. Gartner, M. Dinescu, Appl. Surf. Sci. 2002, 186, 507.
19. B. Angleraud, P. Y. Tessier, Diamond Relat. Mater. 2003, 12, 1093.
20. S. E. Gustafsson, E. Karawacki, M. A. Chohan, J. Appl. Phys. D 1986, 19(5), 727.
21. S. Orain, Y. Scudeller, T. Brousse, Revue de Métallurgie 1999, 96(5), 667.
22. J. Musil, P. Baroch, J. Vlcek, K. H. Nam, J. G. Han, Thin Solid Films 2005, 475, 208.
23. R. B. Dinwiddie, D. G. Onn, Mat. Res. Soc., Symp. Proc 1990, 167, 241.