Deposition temperature effect on electrical properties and interface of high-k ZrO2 capacitor

Journal of Physics D: Applied Physics

Volumn 41, Issue 17, 2008, Pages

  Kim, Joo Hyung ^a,c   Ignatova, Velislava A ^a   Heitmann, Johannes ^b   Oberbeck, Lars ^b  

^a Fraunhofer Center Nanoelectronic Technologies   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

^c Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749095515     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/17/172005     Document Type: Article

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