Structural study of the oxidation process and stability of NbOxNy coatings

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 22, 2008, Pages 4927-4932

  Chappe J M ^a   Carvalho, P ^a   Machado, A V ^a   Vaz, F ^a   Alves, E ^b   Barradas, N P ^b   Fenker, M ^c   Kappl, H ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^c Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem   (Germany)

Author keywords

NbOxNy coatings; Oxidation; Reactive sputtering; Thermal stability

Indexed keywords

ANNEALING; CHEMICAL OXYGEN DEMAND; CONCENTRATION (PROCESS); FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; NIOBIUM; OXIDATION; OXYGEN; REACTIVE SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCALE (DEPOSITS); SPECTROSCOPIC ANALYSIS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ANNEALING TEMPERATURES; CHEMICAL COMPOSITIONS; CRYSTALLINE PHASIS; DC MAGNETRON SPUTTERING; DUTY CYCLES; FOURIER; MULTILAYERED COATINGS; NBOXNY COATINGS; NITROGEN FLOWS; OXIDATION BEHAVIOURS; OXIDATION PROCESSES; OXIDE SCALES; OXYGEN FLOWS; PULSE DURATIONS; REACTIVE GASES; RUTHERFORD BACKSCATTERINGS; SINGLE-LAYER; STRUCTURAL STUDIES; SURFACE OXIDATIONS; THERMAL STABILITY; THIN LAYERS; X-RAY DIFFRACTIONS;

MULTILAYER FILMS;

EID: 54549124434     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.07.030     Document Type: Article

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