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Applied Physics A: Materials Science and Processing

Volumn 93, Issue 3, 2008, Pages 633-637

Thin SiC x layers prepared by hybrid laser-magnetron deposition

(5) Jelinek, Miroslav a,b Kocourek, Tomas a,b Zemek, Josef a Novotný, Michal a Kadlec, Jaromír c

a INSTITUTE OF PHYSICS (Czech Republic)

b CZECH TECHNICAL UNIVERSITY IN PRAGUE (Czech Republic)

c MILITARY ACADEMY (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

BOND STRENGTH (CHEMICAL); CHEMICAL BONDS; DEPOSITION; EMISSION SPECTROSCOPY; EXCIMER LASERS; FABRICATION; GAS LASERS; KRYPTON; LASERS; MAGNETRON SPUTTERING; MAGNETRONS; SILICON; SILICON CARBIDE;

AMORPHOUS; CRYSTALLINITY; DEPOSITION CONDITIONS; HYBRID LASERS; KRF EXCIMER LASERS; MAGNETRON DEPOSITIONS; OPTICAL EMISSIONS; RF DISCHARGES; SUBSTRATE TEMPERATURES;

AMORPHOUS FILMS;

EID: 54549121494 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-008-4727-4 Document Type: Article

Times cited : (6)

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