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Volumn 4, Issue SUPPL.1, 2007, Pages
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A comparison of plasma in laser and hybrid laser-magnetron SiC deposition systems
a
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Author keywords
Laser ablation; Magnetron sputtering; Optical emission spectroscopy
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Indexed keywords
ARGON AMBIENT;
ARGON PRESSURE;
DEPOSITION SYSTEMS;
GRAPHITE TARGET;
HYBRID LASERS;
IN-VACUUM;
KRF LASERS;
LASER TARGETS;
SI ATOMS;
SI EMISSION;
SIC THIN FILMS;
SPATIALLY RESOLVED OPTICAL EMISSION;
TEMPORAL PROFILE;
ARGON;
ATOMIC SPECTROSCOPY;
DEPOSITION;
FILM PREPARATION;
GRAPHITE;
KRYPTON;
LASER ABLATION;
LASER APPLICATIONS;
LASERS;
LIGHT EMISSION;
MAGNETRONS;
OPTICAL EMISSION SPECTROSCOPY;
PHOTORESISTS;
PLASMA DEPOSITION;
PLASMAS;
PROGRAMMABLE LOGIC CONTROLLERS;
PULSED LASER DEPOSITION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SILICON CARBIDE;
TARGETS;
EMISSION SPECTROSCOPY;
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EID: 54549121941
PISSN: 16128850
EISSN: 16128869
Source Type: Journal
DOI: 10.1002/ppap.200732320 Document Type: Conference Paper |
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Times cited : (6)
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References (20)
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