Thin TiCN films prepared by hybrid magnetron-laser deposition

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Kocourek, Tomas ^a   Jelinek, Miroslav ^a   Kadlec, Jaromir ^b   Popov, Cyril ^c   Santoni, Antonino ^d  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b MILITARY ACADEMY   (Czech Republic)

^c UNIVERSITY OF KASSEL   (Germany)

^d ENEA   (Italy)

Author keywords

Laser deposition; Magnetron; Radio frequency discharge; Thin films; TiCN

Indexed keywords

DC MAGNETRON SPUTTERING; FILM PROPERTIES; GLOW-DISCHARGE OPTICAL EMISSION SPECTROSCOPY; HYBRID DEPOSITION; LASER DEPOSITION; LASER DEPOSITIONS; LASER FLUENCES; MAGNETRON POWER; MECHANICAL AND ELECTRONIC PROPERTIES; NITROGEN AMBIENT; RADIO FREQUENCY DISCHARGE; RF DISCHARGE; SI SUBSTRATES; SUBSTRATE TEMPERATURE; TICN; TICN FILMS; TITANIUM CARBONITRIDES; XPS; XRD;

ARGON; CARBON NITRIDE; DEPOSITION; ELECTRONIC PROPERTIES; EMISSION SPECTROSCOPY; GLOW DISCHARGES; KRYPTON; LASERS; MAGNETRONS; MECHANICAL PROPERTIES; OPTICAL EMISSION SPECTROSCOPY; PULSED LASER DEPOSITION; RADIO; RADIO WAVES; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM NITRIDE;

FILM PREPARATION;

EID: 54549103911     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731603     Document Type: Conference Paper

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