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Volumn 47, Issue 4 PART 2, 2008, Pages 2456-2459

Lithographical method by oxidation through a conductive template in contact with a silicon substrate mediated by a thin water layer

(6) Hsieh, Chi Hsiang a Liao, Jiunn Der a Kuo, Chang Shu a Huang, Chao Yu a Wu, Bo Hsiung a Chang, Fuh Yu b

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

Author keywords

Etching resistant patterns; Oxidization imprinting process; Template

Indexed keywords

ETCHING; SILICON;

APPLICATIONS.; CONDUCTIVE; DEPTH GRADIENTS; ETCHING SOLUTIONS; IMPRINTING PROCESSES; LINE PATTERNS; LOW BIAS VOLTAGES; NON THERMALS; OPTICAL; OXIDIZATION; OXIDIZATION IMPRINTING PROCESS; OXIDIZED STRUCTURES; SILICON SUBSTRATES; TEMPLATE; THIN WATER LAYERS; TRACE AMOUNTS;

SUBSTRATES;

EID: 54249167562 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.2456 Document Type: Article

Times cited : (1)

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