SCOPUS 정보 검색 플랫폼

Microelectronics Journal

Volumn 35, Issue 9, 2004, Pages 701-707

Mechanisms of nanooxidation of Si(100) from atomic force microscopy

(1) Fang, Te Hua a

a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

Atomic force microscopy; Nano oxidation; Nanolithography; Silicon; Wear

Indexed keywords

ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; ELECTRIC POTENTIAL; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; OXIDATION; PARAMETER ESTIMATION;

NANO-OXIDATION; NANODOTS; PROBE TIPS; WEAR;

SILICON;

EID: 3943113583 PISSN: 00262692 EISSN: None Source Type: Journal
DOI: 10.1016/j.mejo.2004.06.022 Document Type: Article

Times cited : (28)

References (15)

1
- 0034274051
- T.H. Fang, C.I. Weng, J.G. Chang, Nanotechnology 11 (2000) 181.
- (2000) Nanotechnology , vol.11 , pp. 181
- Fang, T.H.¹ Weng, C.I.² Chang, J.G.³

2
- 36449008633
- A. Majumdar, P.I. Oden, J.P. Carrejo, L.A. Nagahara, J.J. Graham, J. Alexander, Appl. Phys. Lett. 61 (1992) 2293.
- (1992) Appl. Phys. Lett. , vol.61 , pp. 2293
- Majumdar, A.¹ Oden, P.I.² Carrejo, J.P.³ Nagahara, L.A.⁴ Graham, J.J.⁵ Alexander, J.⁶

3
- 0001032487
- M.A. McCord, D.P. Kern, T. Chang, J. Vac. Sci. Technol. B 6 (1988) 1877.
- (1988) J. Vac. Sci. Technol. B , vol.6 , pp. 1877
- McCord, M.A.¹ Kern, D.P.² Chang, T.³

4
- 3943056318
- J.A. Dagata, J. Schneir, H. Harary, C. Evans, M. Postek, J. Bennett, Appl. Phys. Lett. 56 (2001) 1990.
- (2001) Appl. Phys. Lett. , vol.56 , pp. 1990
- Dagata, J.A.¹ Schneir, J.² Harary, H.³ Evans, C.⁴ Postek, M.⁵ Bennett, J.⁶

5
- 0029307008
- N. Kramer, J. Jorritsma, H. Birk, C. Schonenberger, J. Vac. Sci. Technol. B 13 (1995) 805.
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 805
- Kramer, N.¹ Jorritsma, J.² Birk, H.³ Schonenberger, C.⁴

6
- 0032650667
- E. Dubois, J.L. Bubbendoroff, Solid-State Electron. 43 (1999) 1085.
- (1999) Solid-state Electron. , vol.43 , pp. 1085
- Dubois, E.¹ Bubbendoroff, J.L.²

7
- 0001488961
- E.S. Snow, P.M. Campbell, Appl. Phys. Lett. 64 (1994) 1932.
- (1994) Appl. Phys. Lett. , vol.64 , pp. 1932
- Snow, E.S.¹ Campbell, P.M.²

8
- 0000605663
- M. Calleja, R.García, Appl. Phys. Lett. 76 (2000) 3427.
- (2000) Appl. Phys. Lett. , vol.76 , pp. 3427
- Calleja, M.¹ García, R.²

9
- 0004089150
- D. Wang, L. Tsau, K.L. Wang, Appl. Phys. Lett. 65 (1994) 1415.
- (1994) Appl. Phys. Lett. , vol.65 , pp. 1415
- Wang, D.¹ Tsau, L.² Wang, K.L.³

10
- 0030232907
- C. Schonenberger, N. Kramer, Microelectron. Eng. 32 (1996) 203.
- (1996) Microelectron. Eng. , vol.32 , pp. 203
- Schonenberger, C.¹ Kramer, N.²

11
- 0001737534
- A.E. Gordon, R.T. Fayfield, D.D. Litfin, T.K. Higman, J. Vac. Sci. Technol. B 13 (1995) 2805.
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 2805
- Gordon, A.E.¹ Fayfield, R.T.² Litfin, D.D.³ Higman, T.K.⁴

12
- 0026929069
- S.L. Yau, F.F. Fan, A.J. Bard, J. Electrochem. Soc. 139 (1992) 2825.
- (1992) J. Electrochem. Soc. , vol.139 , pp. 2825
- Yau, S.L.¹ Fan, F.F.² Bard, A.J.³

13
- 0012622595
- G. Abadal, F. Perez-Murano, N. Barinol, X. Aymerich, Appl. Phys. A 66 (1998) 5791.
- (1998) Appl. Phys. A , vol.66 , pp. 5791
- Abadal, G.¹ Perez-Murano, F.² Barinol, N.³ Aymerich, X.⁴

14
- 0000688824
- P. Avouris, T. Hertel, R. Martel, Appl. Phys. Lett. 71 (1997) 285.
- (1997) Appl. Phys. Lett. , vol.71 , pp. 285
- Avouris, P.¹ Hertel, T.² Martel, R.³

15
- 0042389706
- H. Kuramochi, K. Ando, H. Yokoyama, Surf. Sci. 542 (2003) 56.
- (2003) Surf. Sci. , vol.542 , pp. 56
- Kuramochi, H.¹ Ando, K.² Yokoyama, H.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.