Analysis of continuous-wave laser lateral crystallized polycrystalline silicon thin films with large tensile strain

Japanese Journal of Applied Physics

Volumn 47, Issue 4 PART 2, 2008, Pages 3046-3049

  Fujii, Shuntaro ^a   Kuroki, Shin Ichiro ^a   Zhu, Xiaoli ^a   Numata, Masayuki ^a   Kotani, Koji ^a   Ito, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

CLC; Crystallization; CW laser; Grain; Poly Si; Strain

Indexed keywords

CRYSTALLIZATION; GRAIN (AGRICULTURAL PRODUCT); GRAIN SIZE AND SHAPE; LASERS; LIGHT MEASUREMENT; NANOCRYSTALLINE ALLOYS; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SOLIDS; THICK FILMS; THIN FILM DEVICES; THIN FILM TRANSISTORS; THIN FILMS;

CLC; CONTINUOUS; CRYSTALLINE SIS; CW LASER; GRAIN; GRAIN SIZES; LATERAL CRYSTALLIZATIONS; PLANE DIRECTIONS; POLY-SI; POLYCRYSTALLINE SILICON THIN FILMS; POLYCRYSTALLINE SILICONS;

TENSILE STRAIN;

EID: 54249085866     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.3046     Document Type: Article

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