Effects of capping layer on grain growth with μ-czochralski process during excimer laser crystallization

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 1 A, 2006, Pages 1-6

  Ming, H E ^a   Ishihara, Ryoichi ^a   Hiroshima, Yasushi ^b   Indue, Satoshi ^b   Shimoda, Tatsuya ^b   Metselaar, Wim ^a,b   Beenakker, Kees ^a,b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b SEIKO EPSON CORPORATION   (Japan)

Author keywords

Capping layer; Excimer laser crystallization; Solidification; Czochralski (grain filter) process

Indexed keywords

AMORPHOUS SILICON; COMPUTER SIMULATION; CRYSTALLIZATION; EXCIMER LASERS; HEAT SINKS; SILICA;

CAPPING LAYER; EXCIMER LASER CRYSTALLIZATION; MOLTEN POOL;

GRAIN GROWTH;

EID: 31544440995     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/jjap.45.1     Document Type: Article

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