Shallow trench isolation liners and their role in reducing lattice strains

Applied Physics Letters

Volumn 93, Issue 14, 2008, Pages

  Floresca, Herman C ^a   Wang, J G ^a   Kim, M J ^a   Smythe, J A ^b  

^a UNIVERSITY OF TEXAS AT DALLAS   (United States)

^b MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDES; SEMICONDUCTING SILICON; SILICON; SPEECH ANALYSIS; STRAIN;

ACTIVE AREAS; AMORPHOUS SILICON (A-SI); CONVERGENT-BEAM ELECTRON DIFFRACTION; LATTICE STRAINS; MATERIAL CONDITIONS; SHALLOW-TRENCH ISOLATION; SHEAR FORCE; SPIN-ON; STI STRUCTURES; STRESS INDUCED; THERMAL OXIDATION; VOLUME SHRINKAGE;

AMORPHOUS SILICON;

EID: 53649098653     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2999589     Document Type: Article

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