Determining the relationship between local lattice strain and slip systems of dislocations around shallow trench isolation by convergent-beam electron diffraction

Applied Physics Letters

Volumn 80, Issue 13, 2002, Pages 2278-2280

  Toda, Akio ^a   Ikarashi, Nobuyuki ^a   Ono, Haruhiko ^a   Okonogi, Kensuke ^b  

^a NEC CORPORATION   (Japan)

^b Elpida Memory Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERGENT-BEAM ELECTRON DIFFRACTION; INTRINSIC STRESS; LOCAL LATTICE; OXIDATION-INDUCED STRESS; SHALLOW TRENCH ISOLATION; SLIP SYSTEM;

ELECTRON DIFFRACTION; SHEAR STRAIN;

SEMICONDUCTING SILICON;

EID: 79956012629     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1465517     Document Type: Article

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