Investigation by Convergent Beam Electron Diffraction of the Stress around Shallow Trench Isolation Structures

Journal of the Electrochemical Society

Volumn 148, Issue 11, 2001, Pages

  Stuer, C ^a   Van Landuyt, J ^a   Bender, H ^b   De Wolf, I ^b   Rooyackers, R ^b   Badenes, G ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001626849     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1404970     Document Type: Article

References (9)

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6. C. Stuer, J. Van Landuyt, H. Bender, R. Rooyackers, G. Badenes, in Microscopy of Semiconductor Materials, 164, A. G. Cullis and R. Beanland, Editors, p. 443, Institute of Physics Conference Series, Oxford (1999).
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