New advanced BARC and gap fill materials based on sublimate reduction for 193nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Takei, Satoshi ^a   Shinjo, Tetsuya ^a   Sakaida, Yasushi ^a   Horiguchi, Yusuke ^a   Nakajima, Yasuyuki ^a  

^a NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

BARC; Dual Damascene; Gap fill material; High etch rate; Iso dense thickness bias; Sublimate reduction

Indexed keywords

CROSSLINKING; ETCHING; LITHOGRAPHY; PHOTORESISTS; SPIN COATING; SUBLIMATION; THIN FILMS;

BARC; DUAL DAMASCENE; GAP FILL MATERIAL; HIGH ETCH RATE; ISO-DENSE THICKNESS BIAS; SUBLIMATE REDUCTION;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 33745627516     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655398     Document Type: Conference Paper

References (7)

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