New polymer platform of BARC for ArF lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 655-662

  Hiroi, Ybshiomi ^a   Kishioka, Takahiro ^a   Sakamoto, Rikimaru ^a   Maruyama, Daisuke ^a   Sakaida, Yasushi ^a   Matsumoto, Takashi ^a   Nakajima, Yasuyuki ^a   Chon, SangMun ^b   Kim, YoungHo ^b   Yoon, Sangwoong ^b   Han, Seok ^b   Kim, YoungHoon ^b   Yoon, EunYoung ^b  

^a NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

^b Manufacturing Technology Team   (South Korea)

Author keywords

ArF; BARC; Defect; Etch rate; Pattern collapse; Resist; Resist profile; Sublimation

Indexed keywords

ARGON; DEFECTS; ETCHING; LITHOGRAPHY; MOLECULAR WEIGHT; PHOTORESISTS; POLYMERIZATION; POLYMERS; SUBLIMATION;

ARF; BARC; ETCH RATE; PATTERN COLLAPSE; RESIST; RESIST PROFILE;

ANTIREFLECTION COATINGS;

EID: 24644525122     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599421     Document Type: Conference Paper

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