Deposition of Ni Ox thin films with radio frequency magnetron sputtering and their characteristics as a source/drain electrode for the pentacene thin film transistor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 5, 2008, Pages 1787-1793

  Yun, Dong Jin ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

NICKEL ALLOYS;

EID: 53349101236     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2981075     Document Type: Article

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