Novel properties of AZO film sputtered in Ar+H2 ambient at high temperature

Vacuum

Volumn 80, Issue 9, 2006, Pages 981-985

  Yanfeng, Sun ^a   Liu, Weifeng ^b   Zhidan, He ^a   Shaolin, Liu ^a   Zhao Yi, Zou ^a   Du, Guotong ^a,b  

^a JILIN UNIVERSITY   (China)

^b State Key Laboratory for Materials Modification by Laser   (China)

Author keywords

Ar+H2 ambient; RF magnetron sputtering; Substrate temperature

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; ZINC OXIDE;

AR+H2 AMBIENT; RF MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 33646890219     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.12.011     Document Type: Article

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