Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system

Vacuum

Volumn 83, Issue 4, 2008, Pages 738-744

  Cada M ^a   Virostko, P ^a   Kment, Š ^a   Hubicka Z ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

Author keywords

Energy influx on substrate; Hollow cathode; Plasma jet; Pulsed DC; Sputtering; TiO2

Indexed keywords

ENERGY INFLUX ON SUBSTRATE; HOLLOW CATHODE; PLASMA JET; PULSED DC; SPUTTERING; TIO2;

EID: 53149151426     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.05.014     Document Type: Article

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