Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 627-631

  Cada M ^a,b   Hubicka Z ^a   Adamek P ^c   Ptacek P ^a   Schova H ^a,b   Ścha M ^a,b   Jastrabk L ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

^c UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

Author keywords

Hollow cathode discharge; Langmuir probe; Plasma jet; ZnO thin films

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLIZATION; HOT CARRIERS; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS; ZINC OXIDE;

CRYSTALLITES;

PLASMA JETS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18144440788     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00581-4     Document Type: Article

References (17)

1. Bárdoš L. Berg S. Baránková H. J. Vac. Sci. Technol. A 11 1993 1486
2. Soukup L. Š́cha M. Fendrych F. et al. Surf. Coat. Tech. 321 1999 116-119
3. Hubička Z. Š́cha M. Pajasova L. et al. Surf. Coat. Tech. 142 2001 681-687
4. Pribil G. Hubička Z. Soukup R.J. Ianno N.J. J. Vac. Sci. Technol. A 19 2001 1571
5. Hubička Z. Pribil G. Soukup R.J. Ianno N.J. Surf. Coat. Tech 160 2002 114
6. Weisse C. Feschner E. Thin Solid Films 32 1976 116-119
7. Park Y.W. Yoon S.J. Choi W.K. Cho B.H. Park C.Y. Korean J. Phys. Soc. 35 1999 517-520
8. Song Y. Kim E.S. Kapila K. J. Electron. Mater. 24 1995 83-86
9. Hickernell F.S. Proc. IEEE 64 1976 70-76
10. Han B.M. Chang S. Kim S.Y. Thin Solid Films 338 1999 265-268
11. Nakada T. Ohkubo Y. Kunioka A. Jpn. J. Appl. Phys. 30 1991 3344-3348
12. Park S.H. Seo B.Ch. Yoon G. J. Vac. Sci. Technol. A 18 2000 2432
13. Bárdoš L. Baránková H. Berg S. Appl. Phys. Lett. 70 1997 577
14. Bradley J.W. Willett D.M. Gonzalvo Y.A. J. Vac. Sci. Technol. A 17 6 1999 3333-3339
15. Špatenka P. Czech. J. Phys. B 38 1988 996-1003
16. Novak M. Sicha M. Kapicka V. Jastrabik L. Soukup L. Hubicka Z. Kilma M. Slavicek P. Brablec A. J. de Physique IV 7 C4 1997 331-339
17. Lagarde T. Arnal Y. Lacoste A. Pelletier J. Plas. Sources Sci. Technol. 10 2001 181-190