Amorphous to anatase transformation in atomic layer deposited titania thin films induced by hydrothermal treatment at 120 °C

Journal of Materials Research

Volumn 23, Issue 9, 2008, Pages 2472-2479

  Zhang, Zhaoming ^a   Triani, Gerry ^a   Fan, Liang Jen ^b  

^a AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; AMORPHOUS SILICON; ATOMIC LAYER DEPOSITION; ATOMIC PHYSICS; ATOMS; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; MESOPOROUS MATERIALS; METALLIC FILMS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; NANOCRYSTALLINE ALLOYS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL VAPOR DEPOSITION; PULSED LASER DEPOSITION; SILICON; SUBSTRATES; THICK FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS TITANIA; AMORPHOUS TO CRYSTALLINE TRANSFORMATION; ANATASE CRYSTALLITES; ATOMIC LAYER DEPOSITED; CRYSTALLINE ANATASE; CRYSTALLINITY; CRYSTALLIZATION PROCESSES; FILM COMPOSITIONS; HYDROTHERMAL TREATMENT; ISO-PROPOXIDE; PHASE TRANSFORMATION; POLYCARBONATE SUBSTRATES; POLYMERIC SUBSTRATES; PRECURSOR CHEMISTRY; SI SUBSTRATE; SUBSTRATE MATERIALS; TI PRECURSOR; TITANIA FILMS; TITANIA THIN FILMS; X RAY ABSORPTION NEAR-EDGE STRUCTURE; X-RAY PHOTOELECTRON SPECTROSCOPY XPS;

AMORPHOUS FILMS;

EID: 52649168403     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0297     Document Type: Article

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