Measurement of thin film isotropic and anisotropic thermal conductivity using 3ω and thermoreflectance imaging

Annual IEEE Semiconductor Thermal Measurement and Management Symposium

Volumn , Issue , 2008, Pages 185-190

  Maize, K ^a   Ezzahri, Y ^a   Wang, X ^a   Singer, S ^b   Majumdar, A ^b   Shakouri, A ^a  

^a University of California Santa Cruz   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

3 method; Anisotropy; Superlattice; Thermal conductivity measurement; Thermoreflectance imaging; Thin film

Indexed keywords

ANISOTROPY; ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; METALS; SEMICONDUCTOR MATERIALS; SOLIDS; SUBSTRATES; SURFACES; THERMAL CONDUCTIVITY; THERMAL INSULATING MATERIALS; THERMAL VARIABLES MEASUREMENT; THERMIONIC EMISSION; THERMOANALYSIS; THERMODYNAMIC PROPERTIES; THERMOELECTRICITY; THICK FILMS; THIN FILM DEVICES; THIN FILMS;

SUPERLATTICE; THERMAL CONDUCTIVITY MEASUREMENT; THERMOREFLECTANCE IMAGING; THIN FILM;

THERMAL CONDUCTIVITY OF SOLIDS;

EID: 51349141435     PISSN: 10652221     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/STHERM.2008.4509388     Document Type: Conference Paper

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