Atomistic nitriding processes of titanium thin films due to nitrogen-implantation

Applied Surface Science

Volumn 254, Issue 23, 2008, Pages 7942-7946

  Kasukabe, Y ^a   Nishida, S ^a   Yamamoto, S ^b   Yoshikawa, M ^b   Fujino, Y ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

EELS; fcc hcp transformation; In situ TEM; Ion implantation; TiN

Indexed keywords

ALUMINUM NITRIDE; BINARY ALLOYS; COVALENT BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ENERGY DISSIPATION; EPITAXIAL GROWTH; ION IMPLANTATION; MOLECULAR ORBITALS; NITRIDING; NITROGEN; PLASMONS; TIN;

EPITAXIAL FORMATION; FCC--HCP TRANSFORMATION; HCP-FCC TRANSFORMATION; IN-SITU TEM; LOWER ELECTRON DENSITY; NITROGEN IMPLANTATION; PLASMON EXCITATIONS; TITANIUM THIN FILMS;

ORBITAL CALCULATIONS;

EID: 51249118985     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.191     Document Type: Article

References (20)

1. Pflüger J., Fink J., Weber W., Bohnen K.-P., and Crecelius G. Phys. Rev. B 30 (1984) 1155
2. Sundgren J.E. Thin Solid Films 128 (1985) 21
3. Min K.-Y., Hohmann S., and Shimizu R. Thin Solid Films 295 (1997) 1
4. Narayan J., Tiwari P., Chen X., Singh J., Chowdhury R., and Zheleva T. Appl. Phys. Lett. 61 (1992) 1290
5. Walker C.G.H., Matthew J.A.D., Anderson C.A., and Brown N.M.D. Surf. Sci. 412/413 (1998) 405
6. Banerjee R., Singh K., Ayyub P., Totlani M.K., and Suri A.K. J. Vac. Sci. Technol. A 21 (2003) 310
7. Shin C.-S., Gall D., Hellgren N., Patscheider J., Petrov I., and Greene J.E. J. Appl. Phys. 93 (2003) 6025
8. Bφ{symbol}ttiger J., Chevallier J., Petersen J.H., Schell N., Matz W., and Mücklich A. J. Appl. Phys. 91 (2002) 5429
9. Wang S., Gudipati R., Rao A.S., Bostelmann T.J., and Shen Y.G. Appl. Phys. Lett. 91 (2007) 081916-081921
10. Hao S., Delley B., Veprek S., and Stampfl C. Phys. Rev. Lett. 97 (2006) 086102-086111
11. Hao S., Delley B., and Stampfl C. Phys. Rev. B 74 (2006) 035424-035431
12. Kasukabe Y., Ootubo J., Nagata S., Kishimoto M., Fujino Y., Yamaguchi S., and Yamada Y. Jpn. J. Appl. Phys. 34 (1995) 3234
13. Kasukabe Y., Takeda S., Fujino Y., Yamada Y., Nagata S., Kishimoto M., and Yamaguchi S. J. Vac. Sci. Technol. A 15 (1997) 1848
14. Kasukabe Y., Saito N., Suzuki M., Yamada Y., Fujino Y., Nagata S., Kishimoto M., and Yamaguchi S. J. Vac. Sci. Technol. A 16 (1998) 3366
15. Kasukabe Y., Wang J.J., Yamamura T., Yamamoto S., and Fujino Y. Thin Solid Films 464-465 (2004) 180
16. Abe H., Naramoto H., Hojou K., and Furuno S. JAERI-Res. 96-047 (1996) 1
17. Adachi H., Tsukada M., and Satoko C. J. Phys. Soc. Jpn. 45 (1978) 875
18. Thomas G.J. In: Geiss H. (Ed). Analytical Electron Microscopy (1981), San Francisco Press, San Francisco 195
19. Robins J.L., and Swan J.B. Proc. Phys. Soc. (London) 76 (1960) 857
20. I. leR. Strydom, S. Hofmann, J. Electron Spectrosc. Relat. Phenom. 56 (1991) 85.