Nitriding transformation of titanium thin films by nitrogen implantation

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 180-184

  Kasukabe, Y ^a   Wang, J J ^a   Yamamura, T ^a   Yamamoto, S ^b   Fujino, Y ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b Japan Atomic Energy Research Institute   (Japan)

Author keywords

EELS; Fcc hcp transformation; In situ TEM; Ion implantation; TiN

Indexed keywords

CHEMICAL BONDS; CRYSTALLIZATION; ELECTRON ENERGY LOSS SPECTROSCOPY; EPITAXIAL GROWTH; ION IMPLANTATION; MOLECULAR STRUCTURE; SODIUM CHLORIDE; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY;

FARADAY CAGES; MOLECULAR ORBITALS; VALENCE BANDS;

THIN FILMS;

EID: 4544374714     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.082     Document Type: Article

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