The contribution of characteristic energy losses in the core-level X-ray photoelectron spectroscopy peaks of TiN and (Ti, Al)N studied by electron energy loss spectroscopy and X-ray photoelectron spectroscopy

Journal of Electron Spectroscopy and Related Phenomena

Volumn 56, Issue 2, 1991, Pages 85-103

  1eR Strydom, I ^a   Hofmann, S ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 44949278023     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/0368-2048(91)80007-H     Document Type: Article

References (25)

1. Characterization of nitride coatings by Auger electron spectroscopy and x-ray photoelectron spectroscopy
2. A correlation of Auger electron spectroscopy, x-ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter-deposited titanium nitride thin films
3. Surface layers on fe formed during plasma nitriding studied by XPS and reflection EELS
4. Molecular-Orbital Interpretation of the Soft X-Ray LII,III Emission and Absorption Spectra from Some Titanium and Vanadium Compounds
5. Quantitative auger electron analysis of titanium nitrides
6. Angular resolved x-ray photoelectron spectroscopy study of reactively sputtered titanium nitride
7. Titanium aluminum nitride films: A new alternative to TiN coatings
8. Occupied and empty surface states of monocrystalline (100) aluminum studied by low electron energy-loss spectroscopy and inverse photoemission