Effect of oxygen partial pressure on the microstructural and physical properties on nanocrystalline tin oxide films grown by plasma oxidation after thermal deposition from pure Sn targets

Vacuum

Volumn 83, Issue 2, 2008, Pages 292-301

  Alaf, Mirac ^a   Guler, Mehmet Oguz ^a   Gultekin, Deniz ^a   Uysal, Mehmet ^a   Alp, Ahmet ^a   Akbulut, Hatem ^a  

^a SAKARYA UNIVERSITY   (Turkey)

Author keywords

Nano tin oxide; Oxygen partial pressure; Resistivity; SnO2; Texture; Thermal evaporation

Indexed keywords

CHEMICAL OXYGEN DEMAND; ELECTRIC RESISTANCE; EVAPORATION; MICROSCOPIC EXAMINATION; MOISTURE; NANOCRYSTALLINE ALLOYS; OXIDATION; OXYGEN; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; STAINLESS STEEL; SUBSTRATES; SURFACE PROPERTIES; TIN; TITANIUM COMPOUNDS; VAPORS;

NANO TIN OXIDE; OXYGEN PARTIAL PRESSURE; RESISTIVITY; SNO2; TEXTURE; THERMAL EVAPORATION;

OXIDE FILMS;

EID: 51249113630     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.06.007     Document Type: Article

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