Investigations of SnO2 thin films prepared by plasma oxidation

Vacuum

Volumn 67, Issue 3-4, 2002, Pages 665-671

  Stryhal Z ^a,c   Pavlik J ^a   Novak S ^a   Mackova A ^b   Perina V ^b   Veltruska K ^c  

^a J E PURKINJE UNIVERSITY   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

AFM; Plasma oxidation; RBS; SnO2 thin film; XPS

Indexed keywords

EVAPORATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; OXIDATION; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; SURFACES; TIN COMPOUNDS;

PLASMA OXIDATION;

THIN FILMS;

EID: 0037179784     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00259-2     Document Type: Conference Paper

References (10)

1. Correa-Lozano B., Comminellis C., Battisti A. J Electrochem Soc. 143:1996;203.
2. Serini P., Briois V., Horrillo M.C., Traverse A., Manes L. Thin Solid Films. 304:1997;113.
3. He Y.S., Campbell J.C., Murphy R.C., Arrendt M.F., Swinnea J.S. J Mater Res. 8:1993;3131.
4. Rella R., Serra A., Siciliano P., Vasanelli L., Licciulli A. Thin Solid Films. 304:1997;339.
5. Lee S.W., Tsai P.P., Chen H. Sens Actuators B. 41:1997;55.
6. Lancok J., Jelinek M., Vyslouzil F., Vrnata M., Myslik V., Santoni A. Fine Mech Opt. 45:2000;336-337.
7. Pavlik J., Hrach R., Hedbavny P., Stovicek P. Superficies Y Vacio. 9:1999;131-134.
8. Saarilathi J., Rauhala E. Interactive personal computer data analysis of ion back scattering spectra. Nucl Instrum Methods Phys Res. B64:1992;734-738.
9. Sanjines R., Coluzza C., Rosenfeld D., Grozzo F., Almeras P., Levy F., Margaritondo G. J Appl Phys. 73:1993;3997.
10. Pavlik J., Stryhal Z., Novak S. Le Vide: Sci Tech Appl. 295(Suppl.):2000;390-392.