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Journal of Applied Physics

Volumn 104, Issue 4, 2008, Pages

Silicon nanocluster crystallization in SiOx films studied by Raman scattering

(7) Hernandez S a Martinez A a Pellegrino, P a Lebour, Y a Garrido, B a Jordana, E b Fedeli, J M b

a UNIVERSITY OF BARCELONA (Spain)

b CEA LETI (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; ARCHITECTURAL ACOUSTICS; BUDGET CONTROL; CHLORINE COMPOUNDS; CRYSTALLINE MATERIALS; CRYSTALLIZATION; FLUID MECHANICS; HYDRAULICS; HYDRODYNAMICS; METALLIC GLASS; NANOCLUSTERS; NANOCRYSTALS; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; PRECIPITATION (CHEMICAL); RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICA; SILICON;

CRYSTALLINE STATES; HYDROSTATIC STRESSES; SI-NANOCRYSTALS;

NANOCRYSTALLINE ALLOYS;

EID: 50849138849 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2968244 Document Type: Article

Times cited : (78)

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