Stress measurements of germanium nanocrystals embedded in silicon oxide

Journal of Applied Physics

Volumn 94, Issue 9, 2003, Pages 5639-5642

  Wellner, A ^a   Paillard, V ^a   Bonafos, C ^b   Coffin, H ^b   Claverie, A ^b   Schmidt, B ^c   Heinig, K H ^c  

^a CNRS   (France)

^b CEMES CNRS   (France)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; GERMANIUM; ION IMPLANTATION; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; SILICA; STRESS ANALYSIS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

STRESS MEASUREMENTS;

NANOSTRUCTURED MATERIALS;

EID: 0242413056     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1617361     Document Type: Article

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