Fluoride antireflection coatings deposited at 193 nm

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Liu, Ming Chung ^a   Lee, Cheng Chung ^a   Liao, Bo Huei ^a   Kaneko, Masaaki ^b   Nakahira, Kazuhide ^b   Takano, Yuuichi ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; FLUORINE COMPOUNDS; LASER DAMAGE; SURFACE ROUGHNESS;

HIGH INDEX; LASER INDUCED DAMAGE THRESHOLDS; LOW INDEX; LOW INDEX MATERIALS; OPTICAL CHARACTERISTICS; RESISTIVE HEATING; STRESS VALUES; SUBSTRATE TEMPERATURE;

COATINGS;

EID: 50849127877     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C214     Document Type: Article

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