Film structure and optical constants of magnetron-sputtered fluoride films for deep ultraviolet lithography

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 431-435

  Taki, Yusuke ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

AlF3; Epitaxy; Fluoride; LaF3; Magnetron sputtering; Optical film; SF6; UV

Indexed keywords

EPITAXIAL GROWTH; FLUORINE; LITHOGRAPHY; MAGNETRON SPUTTERING; MOLECULAR STRUCTURE; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

ALF3; FLUORIDES; LAF3; SF6;

OPTICAL FILMS;

EID: 2442536714     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.009     Document Type: Article

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