Microstructure- and composition-related characteristics of LaF3 thin films at 193 nm

Optical Engineering

Volumn 45, Issue 8, 2006, Pages

  Liu, Ming Chung ^a   Lee, Cheng Chung ^a   Kaneko, Masaaki ^b   Nakahira, Kazuhide ^b   Takano, Yuuichi ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b NIKON CORPORATION   (Japan)

Author keywords

Optical properties; Thin films; Ultraviolet

Indexed keywords

COMPOSITION; CRYSTAL MICROSTRUCTURE; OPTICAL PROPERTIES; STRESSES; THIN FILMS; ULTRAVIOLET RADIATION;

E-BEAM GUN EVAPORATION; LASER-INDUCED DAMAGE THRESHOLD (LIDT); RESISTIVE HEATING;

LANTHANUM COMPOUNDS;

EID: 33751399299     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2227001     Document Type: Article

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