Influence of thermal annealing and ultraviolet light irradiation on LaF3 thin films at 193 nm

Applied Optics

Volumn 44, Issue 32, 2005, Pages 6921-6926

  Lee, Cheng Chung ^a   Liu, Ming Chung ^a   Kaneko, Masaaki ^b   Nakahira, Kazuhide ^b   Takano, Yuuichi ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b Tochigi Nikon   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; ELECTRON GUNS; IRRADIATION; LANTHANUM COMPOUNDS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; VACUUM;

LAF3; RESISTIVE HEATING; ULTRAVIOLET LIGHT IRRADIATION; VACUUM PRESSURE;

THIN FILMS;

EID: 27944488762     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.006921     Document Type: Article

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