Characterization of AlF3 thin films at 193 nm by thermal evaporation

Applied Optics

Volumn 44, Issue 34, 2005, Pages 7333-7338

  Lee, Cheng Chung ^a   Liu, Ming Chung ^a   Kaneko, Masaaki ^b   Nakahira, Kazuhide ^b   Takano, Yuuichi ^b  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EVAPORATION; HEATING; LIGHT TRANSMISSION; MICROSTRUCTURE; REFRACTIVE INDEX; THERMAL EFFECTS; THIN FILMS;

ALUMINUM FLUORIDE; DEPOSITION RATE; OPTICAL LOSS; SUBSTRATE TEMPERATURE;

ALUMINUM COMPOUNDS;

EID: 29344446159     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.44.007333     Document Type: Article

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