Residual stress in Ta2O5-SiO2 composite thin-film rugate filters prepared by radio frequency ion-beam sputtering

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Tang, Chien Jen ^a   Jaing, Cheng Chung ^b   Lee, Kuan Shiang ^a   Lee, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^b MINGHSIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; COMPOSITE FILMS; FILM PREPARATION; INTERFACES (MATERIALS); MODULATION; NOTCH FILTERS; RADIO WAVES; RESIDUAL STRESSES; SPUTTERING; THIN FILMS;

COMPOSITE THIN FILMS; INTERFACE STRUCTURES; LOW INDEX; QUARTER WAVES; RADIO FREQUENCY ION-BEAM SPUTTERING; RUGATE FILTER; SI OXIDE;

ION BEAMS;

EID: 50849124494     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C167     Document Type: Article

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