Stress analysis of ZrO2/SiO2 multilayers deposited on different substrates with different thickness periods

Optics Letters

Volumn 30, Issue 16, 2005, Pages 2119-2121

  Shao, Shuying ^a   Shao, Jianda ^a   He, Hongbo ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON-BEAM EVAPORATION; FUSED-SILICA SUBATRATES; MACROSCOPIC STRESS; MICROSCOPIC DEFORMATION;

DEFORMATION; ELECTRON BEAMS; FUSED SILICA; MULTILAYERS; RESIDUAL STRESSES; STRESS ANALYSIS; X RAY DIFFRACTION ANALYSIS;

ZIRCONIUM COMPOUNDS;

EID: 24344471373     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.30.002119     Document Type: Article

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