Measurement of photoresist grating profiles based on multiwavelength scatterometry and artificial neural network

Applied Optics

Volumn 47, Issue 13, 2008, Pages 2524-2532

  Wei, Shiming ^a   Li, Feng ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP NEURAL NETWORKS; FILM PREPARATION; LASER BEAMS; LIGHT MEASUREMENT; NEURAL NETWORKS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

CHROMIUM THIN FILMS; CRITICAL DIMENSION; HIGH REFLECTIVITY; MULTILAYER SUBSTRATE; NEURAL NETWORK MODEL; ORTHOGONAL POLARIZATIONS; PHOTORESIST GRATINGS; SCANNING ELECTRON MICROGRAPHS;

DIFFRACTION GRATINGS;

EID: 50849091979     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.002524     Document Type: Article

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