Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring

Thin Solid Films

Volumn 455-456, Issue , 2004, Pages 828-836

  Huang, Hsu Ting ^a,b   Terry Jr , Fred L ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b Therma Wave Inc   (United States)

Author keywords

Critical dimension measurement; Process control; Scatterometry

Indexed keywords

CMOS INTEGRATED CIRCUITS; CONTROL SYSTEMS; DIFFRACTION GRATINGS; ELLIPSOMETRY; INDUSTRIAL APPLICATIONS; PROCESS CONTROL; SEMICONDUCTOR MATERIALS; SPECTROSCOPIC ANALYSIS; SURFACE TOPOGRAPHY; X RAY DIFFRACTION ANALYSIS;

CRITICAL DIMENSION MEASUREMENT; REAL-TIME CONTROL METHODS; SCATTEROMETRY; SPECTROSCOPIC ELLIOSOMETRY;

THIN FILMS;

EID: 17144449326     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.010     Document Type: Conference Paper

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