Composition of Ge+ and Si+ implanted SiO2/Si layers: Role of oxides in nanocluster formation

Journal of Non-Crystalline Solids

Volumn 354, Issue 35-39, 2008, Pages 4363-4366

  Krzyzanowska, H ^a   Bubert, H ^b   Zuk, J ^a   Skorupa, W ^c  

^a MARIA CURIE SK ODOWSKA UNIVERSITY   (Poland)

^b LEIBNIZ INSTITUT FÜR ANALYTISCHE WISSENSCHAFTEN ISAS E V   (Germany)

^c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Oxide glasses

Indexed keywords

ATOMIC SPECTROSCOPY; GERMANIUM; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; SILICON COMPOUNDS;

OXIDE GLASSES; X-RAY PHOTOELECTRON SPECTROSCOPY XPS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 50649117745     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.06.052     Document Type: Article

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