Microstructural and photocatalytic properties distribution of TiO2 coatings reactively sputtered as a function of the substrate position relatively to the Ti target

Surface and Coatings Technology

Volumn 202, Issue 20, 2008, Pages 4980-4985

  Aubry, E ^a,b   Miska, P ^a   Gigleux, L ^a   Mezin A ^a   Demange, V ^a   Billard, A ^c  

^a INSTITUT JEAN LAMOUR   (France)

^b UNIVERSITÉ DE FRANCHE COMTÉ   (France)

^c UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD   (France)

Author keywords

High pressure; Photocatalysis; Porous; Sputtering; Stress; Substrates position; TiO2

Indexed keywords

HIGH PRESSURE; MICRO-STRUCTURAL; PHOTOCATALYSIS; PHOTOCATALYTIC PROPERTIES; POROUS; SPUTTERING; STRESS; SUBSTRATES POSITION; TIO2;

EID: 50649112583     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.04.097     Document Type: Article

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