SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 201, Issue 16-17, 2007, Pages 7060-7065

Magnetron sputtering of NASICON (Na3Zr2Si2PO12) thin films. Part II: A novel approach

(3) Horwat, D a Pierson, J F a Billard, A b

a UNIVERSITÉ DE LORRAINE (France)

b UNIVERSITÉ DE TECHNOLOGIE DE BELFORT MONTBÉLIARD (France)

Author keywords

Magnetron co sputtering; Novel method; Sodium superionic conductor; Thin films

Indexed keywords

AMORPHOUS FILMS; ANNEALING; DEPOSITION RATES; IONIC CONDUCTIVITY; REACTIVE SPUTTERING; SODIUM COMPOUNDS; THIN FILMS; ZIRCONIUM ALLOYS;

RADIOFREQUENCY SPUTTERING METHOD; REACTIVE CO-SPUTTERING; SUPERIONIC CONDUCTIVITY;

MAGNETRON SPUTTERING;

AMORPHOUS FILMS; ANNEALING; DEPOSITION RATES; IONIC CONDUCTIVITY; MAGNETRON SPUTTERING; REACTIVE SPUTTERING; SODIUM COMPOUNDS; THIN FILMS; ZIRCONIUM ALLOYS;

EID: 34047256097 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2007.01.016 Document Type: Article

Times cited : (19)

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