The effects of deposition parameters on the structure and properties of titanium-containing DLC films synthesized by cathodic arc plasma evaporation

Surface and Coatings Technology

Volumn 202, Issue 22-23, 2008, Pages 5350-5355

  Tsai, Pi Chuen ^a   Hwang, Yen Fei ^b   Chiang, Jueh Yu ^c   Chen, Wen Jauh ^d  

^a NATIONAL FORMOSA UNIVERSITY   (Taiwan)

^b CHIENKUO TECHNOLOGY UNIVERSITY   (Taiwan)

^c AU OPTRONICS CORPORATION   (Taiwan)

^d NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Adhesive strength (68.35.G); Carbides containing (77.84.B); Cathodic arc plasma (52.75.R, 81.15.G); Diamond like carbon (81.05.T); Mechanical properties (68.60.B); Microstructure (81.40, 61.16.C, 61.16.B); Nanocomposite (61.46, 81.20)

Indexed keywords

DIAMOND FILMS; DIAMOND LIKE CARBON FILMS; DIAMONDS; MIXING; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM;

ADHESIVE STRENGTH (68.35.G); CARBIDES CONTAINING (77.84.B); CATHODIC ARC PLASMA; CATHODIC ARC PLASMA (52.75.R, 81.15.G); DEPOSITION PARAMETERS; DIAMOND-LIKE CARBON (81.05.T); DLC FILMS; MECHANICAL PROPERTIES (68.60.B); MICROSTRUCTURE (81.40, 61.16.C, 61.16.B); NANOCOMPOSITE (61.46, 81.20); STRUCTURE AND PROPERTIES;

CARBON FILMS;

EID: 50349094125     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.06.073     Document Type: Article

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