Large-area Co-silicide nanodot arrays produced by colloidal nanosphere lithography and thermal annealing

Ultramicroscopy

Volumn 108, Issue 10, 2008, Pages 1200-1204

  Cheng, S L ^a   Wong, S L ^a   Lu, S W ^a   Chen, H ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Annealing; Epitaxy; Nanoparticle; Nanosphere lithography; Silicide

Indexed keywords

ANNEALING; COBALT COMPOUNDS; EPITAXIAL GROWTH; HEAT TREATMENT; LITHOGRAPHY; NANOSPHERES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NONMETALS; OPTICAL DESIGN; SEMICONDUCTING SILICON COMPOUNDS; SILICON; TRANSITION METALS;

EPITAXY; NANO-DOT ARRAYS; NANO-DOTS; NANOPARTICLE; NANOSPHERE LITHOGRAPHY; PERIODIC ARRAYS; SILICIDE; SILICON SUBSTRATES;

COBALT;

COBALT; NANOSPHERE; QUANTUM DOT; SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; ELECTRON DIFFRACTION; FOURIER TRANSFORMATION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 50149117921     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2008.04.065     Document Type: Article

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