Growth of size-tunable periodic Ni silicide nanodot arrays on silicon substrates

Applied Surface Science

Volumn 253, Issue 4, 2006, Pages 2071-2077

  Cheng, S L ^a   Lu, S W ^a   Wong, S L ^a   Chen, H ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Epitaxy; Nanodots; Nanosphere lithography; Nickel silicide; Self assembly; Thin films

Indexed keywords

EPITAXIAL GROWTH; GROWTH (MATERIALS); LITHOGRAPHY; SELF ASSEMBLY; SILICON COMPOUNDS; THIN FILMS;

NANODOT ARRAYS; NANOSPHERE LITHOGRAPHY; NICKEL SILICIDE;

NANOSTRUCTURED MATERIALS;

EID: 33751333439     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.04.006     Document Type: Article

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