Stable field emission from screen-printed ZnO-tetrapod emitters

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 4, 2008, Pages 1305-1308

  Hou, Kai ^a   Li, Chi ^a   Lei, Wei ^a   Zhang, Xiaobing ^a   Qu, Ke ^a   Yang, Xiaxi ^a   Zhao, Zhiwei ^a   Wang, Baoping ^a,b  

^a SOUTHEAST UNIVERSITY   (China)

^b Jiangsu Information Display Engineering Research Center   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; FIELD EMISSION; FIELD EMISSION CATHODES; METALS; PELLETIZING; SEMICONDUCTING ZINC COMPOUNDS; SULFATE MINERALS; ZINC; ZINC ALLOYS; ZINC OXIDE;

APPLIED FIELDS; COLD CATHODES; EMISSION CURRENT DENSITY; EMISSION CURRENTS; FIELD EMISSION PROPERTIES; FIELD EMISSIONS; LOW COSTS; PRINTED CATHODE; RAPID HEATING; SCREEN-PRINTING; STABLE FIELDS; TURN-ON FIELD; ZNO TETRAPODS;

FIELD EMISSION DISPLAYS;

EID: 49749107241     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2939259     Document Type: Article

References (27)

1. Deuk-Seok Chung, Appl. Phys. Lett. 80, 4045 (2002).
2. Y. W. Zhu, Appl. Phys. Lett. 83, 144 (2003).
3. Yoshitaka Taniyasu, Makoto Kasu, and Toshiki Makimoto, Appl. Phys. Lett. 84, 2115 (2004).
4. Lei Wei, Xiaobing Zhang, and Zhu Zuoya, J. Vac. Sci. Technol. B 25, 608 (2007).
5. N. S. Xu and S. Ejaz Huq, Mater. Sci. Eng., R. 48, 47 (2005).
6. J. T. L. Thong, C. H. Oon, W. K. Eng, W. D. Zhang, and L. M. Gan, Appl. Phys. Lett. 79, 2811 (2001).
7. Qingliang Liao, Yue Zhang, Yunhua Huang, Junjie Qi, Zhanjun Gao, Liansheng Xia, and Huang Zhang, Appl. Phys. Lett. 90, 151504 (2007).
8. C. J. Lee, T. J. Lee, S. C. Lyu, Y. Zhang, H. Ruh, and H. J. Lee, Appl. Phys. Lett. 81, 3648 (2002).
9. Y. W. Zhu, T. Yu, C. H. Sow, Y. J. Liu, A. T. S. Wee, X. J. Xu, C. T. Lim, and J. T. L. Thong, Appl. Phys. Lett. 87, 023103 (2005).
10. K. W. Wong, X. T. Zhou, Frederick C. K. Au, H. L. Lai, C. S. Lee, and S. T. Lee, Appl. Phys. Lett. 75, 2918 (1999).
11. Y. B. Tang, H. T. Cong, Z. M. Wang, and H.-M. Cheng, Appl. Phys. Lett. 89, 253112 (2006).
12. Soo-Hwan Jeong, Hee-Young Hwang, Kun-Hong Lee, and Yongsoo Jeong, Appl. Phys. Lett. 78, 2052 (2001).
13. Feng Xu, Ke Yu, Guodong Li, Qiong Li, and Ziqiang Zhu, Nanotechnology 17, 2855 (2006).
14. L. Liao, J. C. Li, D. F. Wang, C. Liu, C. S. Liu, Q. Fu, and L. X. Fan, Nanotechnology 16, 985 (2005).
15. Chi Li, Kai Hou, Wei Lei, Xiaobing Zhang, Baoping Wang, and X. W. Sun, Appl. Phys. Lett. 91, 163502 (2007).
16. Kai Hou, Chi Li, Wei Lei, Xiaobing Zhang, Wei Gu, and Daniel den Engelsen, Nanotechnology 18, 335204 (2007).
17. Y. H. Yang, B. Wang, N. S. Xu, and G. W. Yang, Appl. Phys. Lett. 89, 043108 (2006).
18. C. X. Xu and X. W. Sun, Appl. Phys. Lett. 83, 3806 (2003).
19. L. M. Li, Z. F. Du, C. C. Li, J. Zhang, and T. H. Wang, Nanotechnology 18, 355606 (2007).
20. K. F. Chen, K. C. Chen, Y. C. Jiang, L. Y. Jiang, Y. Y. Chang, M. C. Hsiao, and L. H. Chan, Appl. Phys. Lett. 88, 193127 (2006).
21. Q. Wan, K. Yu, T. H. Wang, and C. L. Lin, Appl. Phys. Lett. 83, 2253 (2003).
22. JCPDS Card No. 89-0511.
23. Y. Q. Chen, J. Jiang, Z. Y. He, Y. Su, D. Cai, and L. Chen, Mater. Lett. 59, 3280 (2005).
24. Chun Li, Guojia Fang, Qiang Fu, Fuhai Su, Guohua Li, Xiaoguang Wu, and Xingzhong Zhao, J. Cryst. Growth 292, 19 (2006).
25. Dongxu Zhao, Caroline Andreazza, Pascal Andreazza, Jiangang Ma, Yichun Liu, and Dezhen Shen, Chem. Phys. Lett. 399, 522 (2004).
26. Z. L. Wang, X. Y. Kong, Y. Ding, P. Gao, W. L. Hughes, R. Yang, and Y. Zhang, Adv. Funct. Mater. 14, 943 (2004).
27. Q. H. Li, Q. Wan, Y. J. Chen, T. H. Wang, H. B. Jia, and D. P. Yu, Appl. Phys. Lett. 85, 636 (2004).